发明名称 Method for forming a contact intermediate two adjacent electrical components
摘要 A method for forming a contact intermediate adjacent electrical components including, providing a node to which electrical connections are desired and which is located between two electrical components; providing oxidation conditions effective to grow an oxide cap on the outer portions of each of the adjacent electric components; exposing a given target area between the adjacent electrical components, the given target area being larger than what would otherwise exist if the oxide caps are not present; selectively removing material from within the target area while simultaneously protecting the adjacent electrical components from the selective removal conditions; selectively removing material from the target area thereby exposing the underlying node; and providing an electrically conductive material within the target area and which is disposed in electrical contact with the node.
申请公布号 US6100156(A) 申请公布日期 2000.08.08
申请号 US19980096727 申请日期 1998.06.11
申请人 MICRON TECHNOLOGY, INC. 发明人 PAN, PAI-HUNG;FIGURA, THOMAS ARTHUR
分类号 H01L21/02;H01L21/60;H01L21/8242;H01L27/108;(IPC1-7):H01L21/20 主分类号 H01L21/02
代理机构 代理人
主权项
地址