发明名称 |
Method for forming a contact intermediate two adjacent electrical components |
摘要 |
A method for forming a contact intermediate adjacent electrical components including, providing a node to which electrical connections are desired and which is located between two electrical components; providing oxidation conditions effective to grow an oxide cap on the outer portions of each of the adjacent electric components; exposing a given target area between the adjacent electrical components, the given target area being larger than what would otherwise exist if the oxide caps are not present; selectively removing material from within the target area while simultaneously protecting the adjacent electrical components from the selective removal conditions; selectively removing material from the target area thereby exposing the underlying node; and providing an electrically conductive material within the target area and which is disposed in electrical contact with the node.
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申请公布号 |
US6100156(A) |
申请公布日期 |
2000.08.08 |
申请号 |
US19980096727 |
申请日期 |
1998.06.11 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
PAN, PAI-HUNG;FIGURA, THOMAS ARTHUR |
分类号 |
H01L21/02;H01L21/60;H01L21/8242;H01L27/108;(IPC1-7):H01L21/20 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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