发明名称 Tin-silver alloy electroplating bath and tin-silver alloy electroplating process
摘要 Disclosed is a tin-silver alloy electroplating bath containing: (A) stannous salt; (B) silver salt; (C) one kind or two or more kinds of acids selected from the group consisting of sulfuric acid, phosphoric acid, phosphonic acid, hydroxycarboxylic acid, alkanesulfonic acid, and alkanolsulfonic acid; (D) thiourea; (E) nonionic surface active agent; and (F) one kind or two or more kinds of additives selected from the group consisting of a mercapto group containing aromatic compound, dioxyaromatic compound, and unsaturated carboxylic acid. The electroplating using the above electroplating bath is allowed to form a homogeneous tin-silver alloy plated film having a good external appearance by eliminating preferential deposition of silver and substitutional deposition of silver on an anode and the plated film.
申请公布号 US6099713(A) 申请公布日期 2000.08.08
申请号 US19970977658 申请日期 1997.11.24
申请人 C. UYEMURA & CO., LTD. 发明人 YANADA, ISAMU;TSUJIMOTO, MASANOBU
分类号 C25D3/60;H05K3/34;(IPC1-7):C25D3/56 主分类号 C25D3/60
代理机构 代理人
主权项
地址