发明名称 SUBSTRATE TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate treating device by which pollutant such as particles is prevented from remaining in a treating tank to enable sufficient washing treatment of a substrate. SOLUTION: One sidewall 11 of four sidewalls 11, 12, 13, 14 constituting a treating tank 1 is connected to a sidewall moving mechanism 5. The sidewall moving mechanism 5 is used for raising/lowering the sidewall 11 from/to the other sidewalls 12, 13, 14 and the bottom part, and it is provided with a pulley 53 attached to a rotating shaft 52 of a motor 51, a pulley 55 connected to the pulley 53 through a synchronizing belt 54, and a nut part 58 connected to the sidewall 11 through a connecting member 57, a screw thread 56 fixed to the pulley 5, and a nut part 58 connected to the sidewall 11 through a connecting member 57 and also screwed onto a screw thread 56.
申请公布号 JP2000218243(A) 申请公布日期 2000.08.08
申请号 JP19990021171 申请日期 1999.01.29
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 ARAKI HIROYUKI
分类号 B08B3/04;G02F1/13;G02F1/1333;H01L21/304;H05K3/26;(IPC1-7):B08B3/04;G02F1/133 主分类号 B08B3/04
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