发明名称 VACUUM FILM FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To exchange a number of monitor glasses on every time when a multilayer film is formed on a base and to exchange a number of the glasses in the lump by a cartridge simultaneously with the base while vacuum condition in a vacuum tank is kept in a load lock type vapor deposition apparatus wherein the monitor glass is disposed in the vacuum tank in such a way that a film is formed on the monitor glass at the equal condition to the base and the film forming condition on the base is monitored by irradiating the film with a detecting light. SOLUTION: This apparatus has a cartridge 28 with a holder 43 which performs feeding and recovering movement which moves a number of monitor glasses piled up and stored in a feeding part 32 one by one to a monitor station crossing a light path BL of a detecting light under a condition it is held on a glass holding part 44 and after a film is formed thereon, recovers it to a recovering part. In addition, a cartridge driving mechanism 54 which can mount the cartridge 28 is provided in a vacuum tank and it makes the holder 43 perform the feeding and recovering movement by mounting the cartridge 28 on this cartridge driving mechanism 54 under a positioned condition.
申请公布号 JP2000218149(A) 申请公布日期 2000.08.08
申请号 JP19990018722 申请日期 1999.01.27
申请人 SHIN MEIWA IND CO LTD 发明人 YAMABE SHINICHI
分类号 B01J3/00;B01J3/02;B01J19/00;C23C14/54;(IPC1-7):B01J3/00 主分类号 B01J3/00
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