TREATMENT WITH CHEMICAL LIQUID AND LIQUID CHEMICAL TREATING DEVICE USED FOR THE SAME

摘要

PROBLEM TO BE SOLVED: To fix conditions in a short time and to uniformly treat in the liquid chemical treatment of a substrate in a production process of a photomask for semiconductor, a semiconductor wafer, a liquid crystal panel or the like. SOLUTION: In the liquid chemical treating method for chemically treating the substrate of the photomask 7 or the like by placing the substrate on a rotary stage 1 and spraying the liquid chemical in a sector state from a liquid chemical nozzle 8 in the upper side, the liquid chemical is sprayed while vertically moving and rotating the rotary stage 1. A rotating means for the rotary stage 1 and a vertically moving means for the rotary stage are provided. Because a factor for adjusting the position exposed to the liquid chemical sprayed on the substrate is increased by one, the conditions in the production process of a large-sized substrate are fixed in a short time and the uniform treatment is attained.