发明名称 Ultraviolet light block and photocatalytic materials
摘要 Nanoscale UV absorbing particles are described that have high UV absorption cross sections while being effectively transparent to visible light. These particles can be used to shield individuals from harmful ultraviolet radiation. These particles can also be used in industrial processing especially to produce solid state electronic devices by creating edges of photoresist material with a high aspect ratio. The UV absorbing particles can also be used as photocatalysts that become strong oxidizing agents upon exposure to UV light. Laser pyrolysis provides an efficient method for the production of suitable particles.
申请公布号 US6099798(A) 申请公布日期 2000.08.08
申请号 US19970962515 申请日期 1997.10.31
申请人 NANOGRAM CORP. 发明人 KAMBE, NOBUYUKI;BI, XIANGXIN
分类号 C01G23/04;A61K8/19;A61K8/27;A61K8/29;A61Q17/04;H01J61/35;H01J61/40;H05K3/00;(IPC1-7):A61L2/10;B08B7/00;B32B9/00 主分类号 C01G23/04
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