METHOD FOR MANUFACTURING THIN FILM

摘要

PURPOSE: A method for preparing a thin film by reacting a first reactant and second reactant well is provided which gives a stoichiometric thin film having high and excellent film density. CONSTITUTION: A method comprises the steps of chemically absorbing a first reactant on a substrate by pouring the first reactant in a substrate-containing chamber; removing the first reactant which is physically absorbed on a chemically absorbed first reactant; forming a substance film by pouring gas containing an element having a large attraction to a second reactant to be provided thereafter in the chamber in which the first reactant is removed and reacting with the chemically absorbed reactant; chemically absorbing the first reactant on the substance film by pouring the first reactant in the substance film -forming chamber; removing the first reactant physically absorbed on the chemically absorbed first reactant; and forming a solid film on the substance film by pouring the second reactant in the chamber and chemical substitution of the first reactant and second reactant.