| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film manufacturing apparatus which produces highquality films free from influences of impurities at low costs. SOLUTION: The thin film manufacturing apparatus comprises a feeding preliminary vacuum chamber 1, a preliminary vacuum chamber 5 for winding up a sheeted flexible substrate 6, film forming chambers 2, 4 disposed therebetween, side wall seals 10, 43 for opening/closing holes 9, 42 communicating with the adjacent film forming chambers 2, 4, and inter-chamber seals 3 for opening/closing the communicating holes between the film forming chambers. The feed and winding preliminary vacuum chambers 1, 5 have guide rolls 11, 12, 45, 46 for changing the carrying direction of the flexible substrate 6 between feed rolls 7 or winding up rolls 44 and the communicating holes 9, 42 so that it is parallel to side walls 8, 41 near the communicating holes 9, 42. Closing the side wall seals 10, 43 and the inter-chamber seals 3 perfectly vacuum-seals each film forming chamber, and opening them enables the step carrying.
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