发明名称 SUBSTRATE HAVING REGULAR PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a substrate having a pattern by which a positional dislocation of the pattern, expansion and contraction of the substrate and a rotational dislocation of mutual patterns and the lice can be confirmed easily when two or more of regular patterns are formed by means of various manufacturing processes. SOLUTION: Regular patterns are overlapped which have positioning patterns 21, 22 corresponding to portions except patterns 1, 2 and, more desirable, the positioning patterns 21, 22 are utilized under such a condition that their center of gravity is common but they do not overlap with each other. Namely, the positioning patterns 21, 22 are arranged at two or more of positions except the positions of the regular patterns 1, 2 on the substrate. It is thus possible to easily confirm a positional error of the mutual regular patterns expansion and contraction or a rotational dislocation of the substrate by detecting the positioning patterns 21, 22 and performing positional measuring thereof without an observation of the regular patterns.
申请公布号 JP2000215816(A) 申请公布日期 2000.08.04
申请号 JP19990017226 申请日期 1999.01.26
申请人 DAINIPPON PRINTING CO LTD 发明人 TAKENAKA ATSUSHI
分类号 H01J11/02;H01J11/34;H01J11/44;H01J17/02;H01L21/02;(IPC1-7):H01J11/02 主分类号 H01J11/02
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