| 摘要 |
PROBLEM TO BE SOLVED: To provide a degassing process system having a good efficiency. SOLUTION: The degassing process system comprises a holder for holding a wafer 5 at a high temp. in a wafer dehydrating chamber 6 and an exhaust device 2 for degassing the wafer 5 heated at the high temp. A cryo-panel is provided between the wafer dehydrating chamber 6 and the exhaust device 2, a reductive, dehydrative or rare gas or a mixed gas thereof is inserted at a specified pressure in this chamber 6, and the wafer 5 heated at a high temp. is efficiently degassed.
|
