发明名称 X-RAY STRESS MEASURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide an X-ray stress measuring method capable of cheaply preparing an X-ray stress measuring device and carrying out an X-ray stress measurement in a narrow space. SOLUTION: Characteristic X-ray R is injected to a sample 1 at a constant incident angleϕand a diffraction X-ray diffracted at a plurality of crystal grating surfaces (111), (200), (220),..., (hkl) having a different azimuth existing in the sample 1 is detected. A grating constant (d value) of the respective crystal grating surfaces is determined based on the respective diffraction X-rays detected and a distortion quantityεis calculated from a variation ration of the grating constant against a grating constant in a none-distortion state. Stress valuesσare individually calculated from the respective distortion quantitiesεcalculated, an average value of the respective stress valuesσcalculated is calculated to define it as a target stress value. Since it is not necessary to vary an incident angleϕof the incident X-ray R, a scanning movement mechanism is not required to do it. Therefore, the structure of a device is simple and further cheap. The device can be installed in a narrow space such as the inside of a capillary.</p>
申请公布号 JP2000213999(A) 申请公布日期 2000.08.04
申请号 JP19990015014 申请日期 1999.01.22
申请人 RIGAKU CORP 发明人 OGISO KATSUHIKO
分类号 G01L1/00;G01L1/25;G01N23/20;(IPC1-7):G01L1/00 主分类号 G01L1/00
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