SUBSTRATE WITH BLACK MATRIX THIN FILM, COLOR FILTER SUBSTRATE, TARGET FOR FORMATION OF BLACK MATRIX THIN FILM AND PRODUCTION OF SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To obtain a black matrix thin film of MoTa alloy having excellent optical characteristics, durability and etching processing property, which can be used as a substitute for chromium. SOLUTION: A thin film containing 1 to 13 wt.% Ta and the balance substantially Mo is formed on a substrate. Or, oxides, nitrides, carbides of these elements or a mixture of these can be used. Then the thin film and color filter films are combined to produce a color filter substrate. The target for the formation of a black matrix thin film contains 1 to 13 wt.% Ta and the balance Mo and further contains <=0.1 wt.% of Al+Si+Mn+Ca as impurity elements. This target is used to form a thin film by sputtering on a substrate in an inert gas, gas containing oxygen, nitrogen or carbon or a mixture gas of these.