| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resist composition which can form an elaborate positive pattern having practical sensitivity and peel freeness by using a copolymer having specified properties. SOLUTION: This composition contains an acid-sensitive copolymer prepared by copolymerizing two or more monomers, which in itself insoluble in a basic aqueous solution, becomes soluble in a basic aqueous solution when the protective groups are released from the carboxyl groups protected with protective groups comprising acid anhydride moieties of the formula and bonded to the side chains of the first monomer units of the copolymer by the action of an acid, and the second monomer units of the copolymer containing acid-functional groups protected with protective groups labile to an acid and bonded to the side chains. In the formula, R1 is at least one substituent selected from among H, an alkyl, an alkoxyl, and an alkoxycarbonyl; L is null or a bonding group comprising a 1-6C linear or branched hydrocarbon group; and (n) is 1-4. |
