发明名称 TRANSPARENT BIAXIALLY ORIENTED NYLON FILM FOR VAPOR DEPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain a biaxially oriented nylon film excellent in gas barrier properties which are important characteristics as a film for packaging foods and suitably used as a substrate for a transparent vapor deposition film in which the vapor of an oxide such as silicon oxide or aluminum oxide is deposited. SOLUTION: The characteristic of this transparent biaxially oriented nylon film for vapor deposition is to have an average peak height SRz (μm) of 10 points of the three-dimensional surface roughness and the number of peaks SPc (peaks/0.1 mm2) based on unit area on the film surface satisfying the following ranges: 0.1<=SRz<=0.5 and 10<=SPc<=50.
申请公布号 JP2000212303(A) 申请公布日期 2000.08.02
申请号 JP19990018865 申请日期 1999.01.27
申请人 UNITIKA LTD 发明人 KUWATA HIDEKI;NISHITANI CHIEMI;SAKAKURA HIROSHI
分类号 C08J5/18;B29C55/12;B29K77/00;B29L7/00;B32B27/34;(IPC1-7):C08J5/18 主分类号 C08J5/18
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