SILICON HEAT SHIELD FOR SEMICONDUCTOR ETCHING EQUIPMENT

摘要

PURPOSE: A silicon heat-shield of a high density silicon-etching device is provided to enhance the characteristic of the process for a high density etching by forming an area-extension part on the external surface of a body of the silicon heat shield. CONSTITUTION: On a cylindrical quartz chamber(11), a circle plate-type silicon roof(12) is mounted to open. A coil(13) is wound up on the external side of the quartz chamber(11). On the lower part inside the quartz chamber(11) is electrostatic chuck(15) for holding the wafer(14) is mounted. On the electrostatic chuck(15), the silicon heat shield(16) is formed to induce a uniform etching and to react the fluoro ion.