发明名称 |
Method of crystal growth of a GaN layer over a GaAs substrate |
摘要 |
A method of crystal growth of a GaN layer with an extremely high surface planarity over a GaAs substrate is provided, wherein a GaAs substrate is heated to a temperature in the range of 600 DEG C. to 700 DEG C. without supplying any group-V element including arsenic to form a Ga-rich surface on the GaAs substrate, before a first source material including N and a second source material including Ga are supplied along with a carrier gas onto a surface of the GaAs substrate to form a GaN layer over the GaAs substrate.
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申请公布号 |
US6096130(A) |
申请公布日期 |
2000.08.01 |
申请号 |
US19970824017 |
申请日期 |
1997.03.21 |
申请人 |
NEC CORPORATION |
发明人 |
KIMURA, AKITAKA;SUNAKAWA, HARUO;NIDO, MASAAKI |
分类号 |
C30B29/38;C30B25/02;H01L21/205;H01L33/12;H01L33/16;H01L33/32;H01S5/00;H01S5/323;(IPC1-7):C30B25/14 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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