发明名称 |
Methods for manufacturing photolithography masks utilizing interfering beams of radiation |
摘要 |
A method for manufacturing a photolithography mask. At least two interfering beams of radiation are utilized to define a grid of dividing lines corresponding to an interference pattern produced by the interfering beams on a surface of a photolithography mask coated with a mask film.
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申请公布号 |
US6096458(A) |
申请公布日期 |
2000.08.01 |
申请号 |
US19980129297 |
申请日期 |
1998.08.05 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
HIBBS, MICHAEL STRAIGHT |
分类号 |
G03F1/14;G03F7/20;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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