发明名称 |
Method and apparatus for marking patterns by a scanning laser beam, a mask applied to the same apparatus |
摘要 |
Energy distribution at a section of a laser beam is leveled by causing the laser beam, emitted by a continuous wave Q-switch pulse from a laser oscillator having an acousto-optic Q-switch element, to pass through a mask having a mask pattern. The laser beam having passed the mask is reflected by a pair of reflection mirrors provided on a pair of galvanometers. The reflected laser beam passes through an objective lens and is focused on a processing object. A desired character or sign is marked on the processing object through a scanning with the laser beam focused on the processing object by driving a pair of galvanometers.
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申请公布号 |
US6097420(A) |
申请公布日期 |
2000.08.01 |
申请号 |
US19950563487 |
申请日期 |
1995.11.28 |
申请人 |
NEC CORPORATION |
发明人 |
BABA, YOSHIMITSU;TOGARI, SATOSHI |
分类号 |
B23K26/00;B23K26/06;B23K26/073;B23K26/08;G02B27/09;G06K1/12;(IPC1-7):G02B27/00 |
主分类号 |
B23K26/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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