发明名称 Method and apparatus for marking patterns by a scanning laser beam, a mask applied to the same apparatus
摘要 Energy distribution at a section of a laser beam is leveled by causing the laser beam, emitted by a continuous wave Q-switch pulse from a laser oscillator having an acousto-optic Q-switch element, to pass through a mask having a mask pattern. The laser beam having passed the mask is reflected by a pair of reflection mirrors provided on a pair of galvanometers. The reflected laser beam passes through an objective lens and is focused on a processing object. A desired character or sign is marked on the processing object through a scanning with the laser beam focused on the processing object by driving a pair of galvanometers.
申请公布号 US6097420(A) 申请公布日期 2000.08.01
申请号 US19950563487 申请日期 1995.11.28
申请人 NEC CORPORATION 发明人 BABA, YOSHIMITSU;TOGARI, SATOSHI
分类号 B23K26/00;B23K26/06;B23K26/073;B23K26/08;G02B27/09;G06K1/12;(IPC1-7):G02B27/00 主分类号 B23K26/00
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