发明名称 Laser exposure utilizing secondary mask capable of concentrating exposure light onto primary mask
摘要 A method and apparatus for high resolution imaging of integrated circuits and flat panel displays uses a pulsed laser source, a thermoresist coated image receiving surface and a pair of masks. A primary mask carries the principal image and a secondary mask containing an array of lenslets which concentrate light from the source onto a subset of the features of the primary mask. The secondary mask lenslets are dimensioned so as to illuminate a subset of the features with a known pitch and form an image corresponding to the subset on the thermoresist. After creating a subset image, the secondary mask is moved so as to expose another subset of the features and form another subset image. In this manner, the entire principal image is reconstructed on the thermoresist from subset images. The secondary mask is moved on two axes by a plurality of piezo-electric actuators. Registration and position control of the secondary mask are accomplished by including positioning marks on the primary mask and a photo-detector to resolve the positioning marks and provide position feedback. To increase the power density imparted on the image receiving surface, the laser source may be focused into a concentrated scanning line, which is scanned across the secondary mask so as to further divide the imaging process, while providing additional power density.
申请公布号 US6096461(A) 申请公布日期 2000.08.01
申请号 US19990228078 申请日期 1999.01.06
申请人 CREO SRL 发明人 GELBART, DANIEL
分类号 G03F7/20;(IPC1-7):G03F9/00 主分类号 G03F7/20
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