| 摘要 |
A photolithographic exposure system and method are presented which employ an LCD panel as a configurable mask. The exposure system includes a light source and an LCD panel. The LCD panel displays a desired pattern, and is positioned between the light source and a light-sensitive layer. The LCD panel includes a plurality of pixel elements (i.e., pixels) arranged in a two-dimensional matrix. Each pixel either substantially passes or blocks light produced by the light source in response to one or more electrical display signals. In addition to the LCD panel, an LCD system includes a display driver, a control unit, and a memory unit. The display driver is coupled to the LCD panel and produces the electrical display signals. The memory unit stores LCD panel display data. The control unit is coupled between the display driver and the memory unit The control unit retrieves data from the memory unit and provides the data to the display driver. The control unit may be adapted for coupling to a computer system, and further configured to receive data from the computer system and to store the data within the memory unit. A step-and-repeat projection exposure system is described which employs the LCD panel as a configurable mask. An exposure method employing multiple overlapping exposures reduces the deleterious effects of an opaque structure formed around the pixels to prevent light from passing through the LCD panel between the pixels.
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