| 摘要 |
PURPOSE: A thin-film micromirror array-actuated(TMA) and manufacturing method thereof prevent the damage of a mirror caused by hydrofluoric acid gas to remove a sacrificial layer in an air-gap forming process. CONSTITUTION: The second passivation layer(175) is formed by a PECVD method with the nitride thickness of 100 to 200 angstrom and covers a mirror(160) formed in the upper of a membrane(120). The sixth photo resist is coated to cover the exposed surface of an actuator(170) including the membrane(120), a bottom electrode(125), an active layer(130) and the second passivation layer(175), then an air gap is formed by removing a sacrificial layer with hydrofluoric acid gas. The second passivation layer(175) prevents the mirror(160) from being damaged due to the sixth photo resist-transmitting hydrofluoric acid gas, and doesn't deteriorate the reflectivity of the mirror(160) based upon optical transparency.
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