发明名称 Materials for polishing liquid for metal, polishing liquid for metal, method forpreparation thereof and polishing method using the same
摘要 Provided are a metal-polishing liquid that comprises an oxidizing agent, an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water; a method for producing it; and a polishing method of using it. Also provided are materials for the metal-polishing liquid, which include an oxidized-metal etchant, a protective film-forming agent, and a dissolution promoter for the protective film-forming agent.
申请公布号 AU1804300(A) 申请公布日期 2000.07.31
申请号 AU20000018043 申请日期 1999.12.28
申请人 HITACHI CHEMICAL COMPANY, LTD.;HITACHI LTD. 发明人 TAKESHI UCHIDA;TETSUYA HOSHINO;HIROKI TERAZAKI;YASUO KAMIGATA;NAOYUKI KOYAMA;YOSHIO HONMA;SEIICHI KONDOH
分类号 B24B37/00;C09G1/02;C09K13/00;C23F3/00;H01L21/321 主分类号 B24B37/00
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