发明名称 |
Manufacturing method of synthetic silica glass |
摘要 |
A method of manufacturing synthetic silica glass includes the steps of pressurizing a liquid storage tank including a liquid silicon compound therein, generating bubbles in the liquid silicon compound using a foamer, removing the bubbles using a degasser, displacing the liquid silicon compound into a vaporizer while controlling an amount of the liquid silicon compound displaced by a liquid mass flow meter, mixing the displaced liquid silicon compound with a carrier gas to generate a gaseous silicon compound, injecting the gaseous silicon compound into a synthesis furnace, and forming synthetic silica glass by hydrolyzing the gaseous silicon compound in the synthesis furnace.
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申请公布号 |
US6094940(A) |
申请公布日期 |
2000.08.01 |
申请号 |
US19990265891 |
申请日期 |
1999.03.11 |
申请人 |
NIKON CORPORATION |
发明人 |
FUJIWARA, SEISHI;KOMINE, NORIO;JINBO, HIROKI;SUWA, TOSHITSUGU |
分类号 |
C03B8/04;C03B19/14;(IPC1-7):C03B20/00 |
主分类号 |
C03B8/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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