发明名称 Manufacturing method of synthetic silica glass
摘要 A method of manufacturing synthetic silica glass includes the steps of pressurizing a liquid storage tank including a liquid silicon compound therein, generating bubbles in the liquid silicon compound using a foamer, removing the bubbles using a degasser, displacing the liquid silicon compound into a vaporizer while controlling an amount of the liquid silicon compound displaced by a liquid mass flow meter, mixing the displaced liquid silicon compound with a carrier gas to generate a gaseous silicon compound, injecting the gaseous silicon compound into a synthesis furnace, and forming synthetic silica glass by hydrolyzing the gaseous silicon compound in the synthesis furnace.
申请公布号 US6094940(A) 申请公布日期 2000.08.01
申请号 US19990265891 申请日期 1999.03.11
申请人 NIKON CORPORATION 发明人 FUJIWARA, SEISHI;KOMINE, NORIO;JINBO, HIROKI;SUWA, TOSHITSUGU
分类号 C03B8/04;C03B19/14;(IPC1-7):C03B20/00 主分类号 C03B8/04
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