发明名称 Spatially uniform deposition of polymer particles during gate electrode formation
摘要 A method for uniformly depositing of polymer particles onto the surface of a gate metal during the formation of a gate electrode. In one embodiment, the present invention comprises immersing a substrate having a layer of a gate metal disposed over the surface thereof in a fluid bath containing polymer particles. In this embodiment, the fluid bath is contained within a fluid bath tank. Additionally, in the present embodiment, the layer of the gate metal disposed over the substrate has a thickness approximately the same as a desired thickness of the gate electrode to be formed. Next, the present embodiment applies a uniform potential across the surface of the layer of gate metal such that the polymer particles are uniformly deposited onto the layer of the gate metal. In so doing, the present embodiment uniformly deposits the polymer particles onto the layer of the gate metal. In the present embodiment, the polymer particles adhere to the surface of the layer of the gate metal via Van der Waal's forces and/or via a charge difference between the layer of the gate metal and each of the polymer particles. In this embodiment, the polymer particles are deposited over the surface of the layer of the gate metal with a spatial density of approximately 1x108 to 1x1012 particles per square centimeter. The present embodiment then removes the substrate having the layer of the gate metal and the particles deposited thereon from the fluid bath.
申请公布号 US6095883(A) 申请公布日期 2000.08.01
申请号 US19970963010 申请日期 1997.11.03
申请人 CANDLESCENT TECHNOLOGIES CORPORATION 发明人 ELIZONDO, PHILIP J.;CHAKRAVORTY, KISHORE K.;CAUDILLO, DAVID
分类号 H01J9/02;(IPC1-7):H01J9/02 主分类号 H01J9/02
代理机构 代理人
主权项
地址