In situ measurement of particle size during deposition onto substrate, e.g. for nanotechnology applications, includes a step for measuring increase in rate of conductance for deposited particle film

摘要

The rate of increase in deposited particle film conductance and the surge in this rate are also measured during particle deposition, and used to determine mean particle size. A method for measuring the size of flowing, conductive or semiconducting particles, comprises depositing a flow of particles (5) onto a substrate (1) to form e.g. a film (9, 10) and then measuring the size of the particles in the film. The rate of increase in film conductance and the surge in this rate are also measured during particle deposition, and used to determine mean particle size. An Independent claim is also included for the particle size measuring device, comprising a measuring bridge (B) with two electrodes (2, 3) spaced apart on top of a non-conductive substrate, and a film conductance measuring device.