| 摘要 |
PROBLEM TO BE SOLVED: To provide the photosensitive resin composition high in sensitivity to near infrared rays specified in wavelength region, especially, semiconductor laser beams or YAG laser beams and to provide the lithographic printing plate and the method for manufacturing this lithographic printing plate by using this resin composition. SOLUTION: The photosensitive resin composition comprises a polymer selected from a novolak resin or a polyvinylphenol resin, an amino compound derivative capable of cross-linking that resin, a near infrared absorbing dye, and a photoacidgenerator. The near infrared absorbing dye is at least one kind of dye selected from dyes having N,N-diaryliminium salt structures in the molecule represented by the formula and the like. In the formula, each of X1 and X2 is a -S- or -O- or -CH=CH group or the like; L1 is an optionally substituted 9-13C methine group; each of A1 and A2 is an optionally substituted aromatic group; each of R21 and R22 is, independently, optionally substituted 1-15C alkyl group; and Z- is a counter ion. |
