| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and apparatus for removing contamination that have high cleaning effect even with a laser light of an intensity that does not destroy an object to be cleaned. SOLUTION: A method and apparatus for removing the contamination by applying oscillation to a material to be treated in a method for removing the contamination, by irradiating the material to be treated on which the contamination is deposited with a laser light emitted from a laser light source. As as embodiment, a pulse laser light 2 from a pulse laser 1 is condensed by a lens 3 and a substrate 4 is irradiated therewith. The substrate 4 is set on a substrate holder 5. The substrate 4 is provided with an actuator, which is driven by an actuator driving power 7 and constituted so that the oscillation direction is selected as required (no figure is shown). The substrate holder 5 is provided on a movable stage 8 (movable in the directions of three axes, X, Y and Z).
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