发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To improve product yield and throughput in a method of manufacturing a semiconductor device and a semiconductor manufacturing apparatus which perform grinding with a wafer laminated onto a tape. SOLUTION: The method comprises step 30 of laminating a wafer onto an extension tape expandable by the ultraviolet irradiation, step 31 of full-dicing the wafer to form individualized semiconductor chips, step 32 of expanding the expansion tape by the ultraviolet irradiation after ending the dicing step, and step 33 of grinding the expansion tape to ground the back surface of the wafer after the tape expansion step.</p>
申请公布号 JP2000208446(A) 申请公布日期 2000.07.28
申请号 JP19990010908 申请日期 1999.01.19
申请人 FUJITSU LTD 发明人 YAMADA YUTAKA
分类号 H01L21/683;H01L21/301;H01L21/68;H01L21/78;(IPC1-7):H01L21/301 主分类号 H01L21/683
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