| 摘要 |
PROBLEM TO BE SOLVED: To reduce the size of a resist peeling apparatus by making it possible to execute the treatment equivalent to the treatment in a resist peeling apparatus equipped with a plurality of peeling chambers, with a resist peeling apparatus equipped with just one peeling chamber for peeling the resist using peeling liquids injected from nozzles. SOLUTION: A multiplicity of transporting rollers 4 for horizontally supporting a glass substrate 3 are arranged in a peeling chamber 2, and pipes 7 and 8 having shower nozzles 9 are disposed on both upper and lower sides across these transporting rollers 34. The peeling liquids in housing tanks 13 and 14 disposed below the peeling chamber 2 are supplied via supply piping 16 and 17, solenoid valves 18 and 19 and piping 15 to the pipes 7 and 8 and are recovered into storage tanks 13 and 14 via recovering piping 28 and solenoid valves 29 and 30. The peeling liquids in the storage tanks 13 and 14 are self- circulated via supply piping 16 and 17, filters 22 and 23, branch piping 24 and 25 and solenoid valves 26 and 27. The respective solenoid valves 18, etc., are so controlled as to supply the peeling liquids of the storage tanks 13 and 14 to the shower nozzles 9. |
