发明名称 |
RESIST SUBSTRATE FOR X-RAY EXPOSURE, ITS PRODUCTION, PRODUCTION OF DIE USING SAME AND PRODUCTION OF MICRO- PARTS USING THE DIE |
摘要 |
PROBLEM TO BE SOLVED: To reliably and tightly bond a resist layer to a metallic substrate layer by fixing the resist layer comprising a polymethyl methacrylate plate or sheet on the metallic substrate layer comprising a plating layer by way of a metallic middle layer. SOLUTION: This resist substrate 1 for X-ray exposure has a metallic substrate layer 2 comprising Ni, a middle layer 3 comprising Ni and a resist layer 4 comprising PMMA(polymethyl methacrylate). The, middle layer 3 is formed on the resist layer 4 by sputter vapor deposition and the metallic substrate layer 2 is formed by way of the middle layer 3 by electroplating using one of the substrate layer 2 and the middle layer 3 as an electrode. When electroplating is carried out at <=40 deg.C plating bath temperature, the warping and cracking of the metallic substrate layer 2 are inhibited even if the substrate layer 2 has a relatively large thickness and the resist substrate 1 for X-ray exposure is produced in a good yield. The adhesion of the resist layer 4 to the middle layer 3 is further improved by disposing a surface layer having fine ruggedness on the resist layer 4. |
申请公布号 |
JP2000206696(A) |
申请公布日期 |
2000.07.28 |
申请号 |
JP19990006730 |
申请日期 |
1999.01.13 |
申请人 |
RITSUMEIKAN;OPTONIX SEIMITSU:KK |
发明人 |
KINUTA KIYOSHIZU;SUGIYAMA SUSUMU |
分类号 |
H01L21/027;C25D5/56;G03F7/039;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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