| 摘要 |
PROBLEM TO BE SOLVED: To ensure high transmittance to far UV or other active actinic radiation, dry etching resistance, high sensitivity and good aqueous alkali developability by incorporating a specified aqueous alkali-soluble resin, a compound which generates an acid when irradiated with active actinic radiation, a compound which reduces the solubility of a coating film by an acid catalyzed reaction and a specified ionic dissociable compound. SOLUTION: A patter forming material to be used contains an aqueous alkali- soluble resin having cyclic hydrocarbon groups, alcoholic hydroxyl groups and carboxylic acid groups in a side chain, a compound which generates an acid when irradiated with active actinic radiation, a compound having reactivity by which the solubility of a coating film to an aqueous alkali solution is reduced by an acid catalyzed reaction and an ionic dissociable compound of the formula or the like. In the aqueous alkali-soluble resin, carboxylic acid groups occupy 20 to <50% of the total number of the functional groups of the side chain. In the formula, R1-R4 are each H, 1-7C alkyl or aryl and Y1 is Cl, Br, I or the like. |
