发明名称 EXPOSING SYSTEM AND METHOD
摘要 PROBLEM TO BE SOLVED: To control the magnification of a shot being exposed while suppressing the effect of dust onto a reticle. SOLUTION: A reticle temperature measuring unit 8 disposed closely to a reticle 6 conducts noncontact surface temperature measurement of the reticle 6 and a lens controller 9 controls the demagnification of a demagnification projection lens 7 based on the measurement results from the reticle temperature measuring unit 8.
申请公布号 JP2000208390(A) 申请公布日期 2000.07.28
申请号 JP19990004605 申请日期 1999.01.11
申请人 NEC KYUSHU LTD 发明人 HAYASHI SHOICHIRO
分类号 H01L21/027;G03F7/20;G03F9/00;(IPC1-7):H01L21/027 主分类号 H01L21/027
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