发明名称 SERVO CONTROL AND ITS APPLICATION FOR LITHOGRAPHY PROJECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a servo control method and device with which the positioning error relating to vibration in a lithography projection device can be reduced. SOLUTION: A cable slab 16 carries compressed air, a coolant and/or a power source channel from a stationary frame 19 to a wafer table 12 in the photolithography device. The strength added to a movable table 12 is measured by a strength sensor 17 attached between the moving table 12 and the mounting bracket 16 provided for the cable slab. A control signal is generated by the strength signal outputted by the strength sensor 17, and the strength to be added to the movable table 12 is added to an electric linear motor which drives the wafer table for the purpose of opposing to the effect of the strength added to the wafer table by the cable slab 16.
申请公布号 JP2000208412(A) 申请公布日期 2000.07.28
申请号 JP20000000868 申请日期 2000.01.06
申请人 ASM LITHOGRAPHY BV 发明人 HULTERMANS SEBASTIAAN CORNELIS
分类号 H01L21/027;G01Q30/06;G03F7/20;(IPC1-7):H01L21/027 主分类号 H01L21/027
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