| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a system for local etching in which throughput of local etching is enhanced by preheating a discharge tube before starting plasma discharge. SOLUTION: A local etching system comprises a plasma generator 1, an alumina discharge tube 2 and a heater 6. The heater 6 comprises an electric heating wire 60, a power supply 61 for applying a voltage to the electric heating wire 60, and voltage booster 62 for controlling the voltage being applied to the electric heating wire 60. Since the alumina discharge tube 2 can be heated up to a desired temperature by means of the heater 6 until immediately before plasma discharge is generated from the plasma generator 1, local etching work can be started immediately upon generation of plasma discharge without waiting temperature rise of the alumina discharge tube 2 up to a desired level with the heat of plasma discharge.
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