发明名称 |
SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND ITS MANUFACTURE |
摘要 |
PROBLEM TO BE SOLVED: To enhance adhesion of a bonding pad to a wire. SOLUTION: In this semiconductor integrated circuit device, an Al wire 35 of an uppermost layer is constituted by a composite film, comprising a first barrier metal constituted by lamination films of a Ti film 30 and a TiN film 32, and a second barrier metal constituted by an Al-Si-Cu film 33 deposited on this barrier metal and a TiN film 34 deposited on the Al-Si-Cu film 33, thereby preventing deposition of a reaction product of Al and Ti on the surface of a bonding pad. |
申请公布号 |
JP2000208520(A) |
申请公布日期 |
2000.07.28 |
申请号 |
JP20000049519 |
申请日期 |
2000.02.25 |
申请人 |
HITACHI LTD;HITACHI ULSI SYSTEMS CO LTD |
发明人 |
SUZUKI MASAYASU;NISHIHARA SHINJI;SAWARA MASASHI;ISHIDA SHINICHI;ABE HIROMI;TODA SONOKO;UCHIYAMA HIROYUKI;TSUGANE HIDEAKI;YOSHIURA AIMEI |
分类号 |
H01L23/52;H01L21/3205;H01L21/60;H01L21/768;H01L23/522 |
主分类号 |
H01L23/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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