发明名称 ROTARY APPARATUS FOR PROCESSING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a rotary apparatus for processing a substrate which enables the rim of the substrate to be positively held by a simple construction. SOLUTION: A rotary apparatus 10 for processing a substrate comprises a substrate holding member for holding a substrate W on a table 14, which has at least one or more movable substrate holding member 17A and a fixed substrate holding member 17B. The movable substrate holding member 17A has a turntable portion 29, which can be rotated with a wing 31 receiving a flow of air generated during the turning of the table 14, and during the turning a part of the wing 31 pushes the rim of the substrate to hold it. The action for holding the substrate becomes larger, the higher the speed of the rotation of the table 14, i.e.,substrate W is, thus allowing the substrate W to be held positively.
申请公布号 JP2000208591(A) 申请公布日期 2000.07.28
申请号 JP19990003225 申请日期 1999.01.08
申请人 SONY CORP 发明人 FURUKAWA TOMOHARU
分类号 H01L21/683;B05C11/08;G03F7/16;G03F7/30;H01L21/027;H01L21/68 主分类号 H01L21/683
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