METHOD AND SYSTEM FOR PLASMA PROCESSING

摘要

PROBLEM TO BE SOLVED: To stabilize processing in a plasma processing system such that two values of microwave power correspond to one value of RF voltage Vpp. SOLUTION: A correlation curve measuring mechanism 13f is provided in a controller 13d in order to find the correlation curve between a microwave power and an RF voltage Vpp received from an RF voltage detector 13a through the correlation curve measuring mechanism 13f. The correlation curve measuring mechanism 13f determines a set value of microwave power from the correlation curve. The controller 13d controls microwave power of a magnetron, based on the set value.