METHOD FOR MANUFACTURING INFORMATION CARRIER

摘要

PROBLEM TO BE SOLVED: To manufacture an information carrier in which a highly reliable thin film pattern corresponding to a digital information signal is formed using a pattern exposing process by an electron beam drawing apparatus. SOLUTION: This manufacturing method comprises a process to deposit a thin film 12 on the surface of a base material 11, a process to form an exposing position reference mark 21 having the particular shape on the thin film, a process to form a resist layer 13 on the thin film and exposing position reference mark and a process to execute pattern exposure of the resist layer using an electron beam drawing apparatus. The electron beam drawing apparatus is provided with a movable stage for moving the base material within the plane parallel to the base material surface and an electron detector for seizing the reflected electrons emitted from the base material surface. In the pattern exposure process, the time when the electron beam 83 passes on the exposure position reference mark 21 is detected with the electron detector and the timing for irradiating the electron beam 83 is controlled with reference to the passing time.