METHOD FOR MANUFACTURING ELECTRON BEAM DEVICE, AND IMAGE CREATING DEVICE MANUFACTURED BY THESE MANUFACTURING METHODS, METHOD FOR MANUFACTURING ELECTRON SOURCE, AND APPARATUS FOR MANUFACTURING ELECTRON SOURCE, AND APPARATUS FOR MANUFACTURING IMAGE CREATING DEVICE

摘要

In a step of manufacturing an image creating device (electron beam device) comprising an electron emitting device, specifically surface conduction electron emitting device, a face-plate electrode (72) and a wiring (74) of an electron source substrate (71) on which the wiring and a device electrode are formed are opposed to each other and projections are eliminated by applying a predetermined voltage between the wiring (74) and the electrode (72) and causing electric discharge previously. By thus subjecting an electric field applying process to the electron source substrate (71), the factor of electric discharge, such as projections in the electron source, caused when the electron beem device represented by an image creating device is constituted and driven is eliminated, and therefore, the image creating device has a good display performance without any unlit pixel on a display image even after a long time image display.