| 摘要 |
<p>Reactive gases, such as hydrogen-base carrier gas and silane gas, are brought into contact with a heated catalyst such as tungsten. The resulting reactive seed is subjected to an electric field created by either a DC voltage below the glow voltage or the DC voltage on which an AC or RF voltage is superposed. As a result, the seed is given kinetic energy, and high-quality film such as polysilicon film is formed on a substrate by vapor phase deposition.</p> |
