发明名称 LASER ALIGNMENT SYSTEM FOR PROCESSING SUBSTRATES
摘要 A laser alignment system includes a processing device that can direct a laser beam during a marking or scribing process of a substrate surface. Misalignment between the substrate and the processing device can be corrected by directly rotating the substrate by a rotating chuck (22) rather than lifting or reorienting the substrate using a robotic substrate handler (16), thus eliminating mechanical reorientation of the substrate. A sensing system (20) is used which includes a light source which illuminates the substrate edge. Light sensors, such as CCD sensors, positioned on an opposite side of the substrate can detect the substrate edge and so locate a reference flat or notch as the substrate is rotated.
申请公布号 WO0043157(A1) 申请公布日期 2000.07.27
申请号 WO2000US01819 申请日期 2000.01.25
申请人 INTERGEN, INC. 发明人 MADEYSKI, KRIS;HORN, JOHN
分类号 B23K26/04;(IPC1-7):B23K26/03 主分类号 B23K26/04
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