COMPOUND CONTAINING MULTI-OXYGEN FOR PREVENTING DIFFUSION OF ACID AND PHOTORESIST COMPOSITION CONTAINING THE SAME

摘要

PURPOSE: A compound for preventing diffusion of acid is provided, which prevents diffusion of acid generated in exposure portion to non-exposure portion during photolithography processing. A photoresist composition containing the compound is also provided. CONSTITUTION: A crown ether or polyethylene glycol derivative containing multi-oxygen is provided as the compound for preventing diffusion of acid. The photoresist composition comprises photoresist copolymer, photoacid generator, the compound containing multi-oxygen as additive agent for preventing diffusion of acid, and organic solvent.