POSITIVE TYPE RESIST COMPOSITION AND MONOMER CONTAINING ACID DISSOCIATIVE GROUP USED TO THE SAME

摘要

PURPOSE: A positive type resist composition is provided, which forms a resist pattern having excellent electron-beam resistance due to be good at sensitivity, resolution property, pattern profile formation. CONSTITUTION: A positive type resist composition comprises polymer containing the unit represented by the following formula(1) and photo acid generator, wherein R represents hydrogen atom or low alkyl group, R' represents alkyl group of two more carbon number and n is 0 or 1. The monomer containing the acid dissociative group represented by the following formula(6), wherein R represents hydrogen atom or low alkyl group and R' represents alkyl group of two more carbon number.