发明名称 |
METHOD FOR PRODUCING INDIUM-TARTAR-OXIDE SINTERED MATERIAL OF HIGH DENSITY |
摘要 |
PURPOSE: A method for producing indium-tartar-oxide sintered material of high density having the excellent characteristic as a sputtering target and appropriated on an industry is provided to sinter after forming an indium-tartar-oxide powder. CONSTITUTION: A powder contained an indium, a tartar and oxygen is formed. The formed material is sintered on air contained oxygen gas. Thereby an indium-tartar-oxide sintered material is produced. A halogen content of the powder is under 0.02wt%. A concentration of oxygen in the air contained oxygen gas is over 90% during sintering. A partial pressure of moisture contained in the air contained oxygen gas is under 800Pa during sintering and is maintained at 1500-1650°C over 1hour to sinter the formed material.
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申请公布号 |
KR20000047821(A) |
申请公布日期 |
2000.07.25 |
申请号 |
KR19990054129 |
申请日期 |
1999.12.01 |
申请人 |
SUMITOMO CHEMICAL CO., LTD. |
发明人 |
HASEKAWA AKIRA;HUJIWARA SHINJI;SAEKUSA KUNIO |
分类号 |
B22F1/00;C04B35/453;C23C14/34;(IPC1-7):B22F1/00 |
主分类号 |
B22F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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