| 摘要 |
PURPOSE: Developing solutions in which the build-up of scum and residue is reduced are provided. CONSTITUTION: An alkaline aqueous developing solution for developing photoresists or the like contains, as an anti-scum agent: A) between about 0.05 and about 1.0 wt% of a first surfactant or surfactant mixture, the first surfactant(s) having the general formula: R-O-(AO)n-H where AO are alkylene oxide units selected from ethylene oxide units (CH2-CH2-O) and propylene oxide units (CH(CH3)-CH2-O) or (CH2-CH(CH3)-O) and mixtures of ethylene and propylene oxide units, either in the mixture of molecules, where R is a hydrophobic group, n is between about 8 and about 200, and B) as a second surfactant, between about 0.05 and 1.0 wt% of an organic salt having the formula: where R is an alkyl or aryl group, preferably phenyl, A is selected from carboxyl, sulfonyl, phosphonyl and mixtures thereof, preferably sulfonyl, M is a charge-balancing cation, and n is between 1 and about 200, preferably between 2 and about 100, the weight ratio of A) to B) being between about 1:5 and about 5:1.
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