发明名称 SUBSTRATE CHAMFERING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate chamfering device capable of efficiently performing high accurate chamfering of a transparent substrate regardless of dispersion of size and thickness of the handled transparent substrate and work accuracy, mounting accuracy, etc., of a sucker table itself. SOLUTION: A height detector 15 is set up in the upward of a sucker stage 12 sucking and fixing a liquid crystal cell 11. The height detector 15 continuously measures in a feed direction a variation amount of height in the vicinity of one side in an upper surface of a glass substrate 11a formed as an upper surface of the liquid crystal cell 11 and/or a variation amount of height of a fixed surface 12c. A main control part 20 controls a moving amount of a control shaft 16a and 17a in accordance with a measurement result by the height detector 15, as this result, respective position correction of a pair of polishing devices 14, 14 is performed.
申请公布号 JP2000202749(A) 申请公布日期 2000.07.25
申请号 JP19990005811 申请日期 1999.01.12
申请人 SHARP CORP 发明人 OSAKI MORIHIDE
分类号 B24B49/04;B24B9/00;B24B9/10;(IPC1-7):B24B9/00 主分类号 B24B49/04
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