发明名称 Electroplating apparatus
摘要 An electroplating apparatus is made up of a cup having a plating solution therein, a plating solution controlling unit which overflows the plating solution from the cup, a holding unit which holds an object to be plated so as to contact to the overflowed plating solution, and a mesh shaped anode electrode provided in an internal portion of the cup, the mesh shaped anode electrode having a surface comprising a metal which are plated by the plating solution. Accordingly, the electroplating apparatus can get the plated film having a smooth surface.
申请公布号 US6093291(A) 申请公布日期 2000.07.25
申请号 US19980126845 申请日期 1998.07.31
申请人 OKI ELECTRIC INDUSTRY CO., LTD. 发明人 IZUMI, TAKAYUKI;OKAJIMA, TAKEHIKO
分类号 C25D5/08;C25D7/12;C25D17/12;(IPC1-7):C25D17/00;C25B9/00;C25B11/00 主分类号 C25D5/08
代理机构 代理人
主权项
地址