ALIGNMENT MARK FOR EXPOSURE, ALIGN SYSTEM USING IT AND ALIGN METHOD USING IT

摘要

PURPOSE: An alignment mark, system and method for exposure is provided to a preferred alignment signal without damage in a chemical or mechanical polishing process. CONSTITUTION: An alignment mark, system and method comprising forming in a lower layer of the layers utilizing the chemical or mechanical polishing process on the semiconductor substrate, when an align to exposure process to make a semiconductor device, as the alignment mark of an alignment signal wave type of formed, characterized with the alignment discontinuous plural mesa pattern(55A) or trench pattern(55B) with the density in the degree of without dishing on the layer utilizing chemical or mechanical polishing process.