| 摘要 |
<p>PURPOSE: A method of forming a coating on a substrate by depositing a solution of a resin containing Si-H groups is provided. CONSTITUTION: Si-H containing resins are applied to the substrates as solvent dispersions. Solvents which may be used include any agent or mixture of agents which will dissolve or disperse the resin to form a homogeneous liquid mixture without affecting the resulting coating or the substrate. These solvents can include alcohols such as ethyl alcohol or isopropyl alcohol; aromatic hydrocarbons such as benzene or toluene; branched or linear alkanes such as n-heptane, dodecane or nonane; branched or linear alkenes such as n-heptane, dodecene or tetradecene; ketones such as methyl isobutyl ketone; esters; ethers such as glycol ethers; or siloxanes such a linear (e.g. hexamethyldisiloxane, octamethyldisiloxane and mixtures thereof), cyclic dimethylpolysiloxanes, or mixtures of any of the above solvents. The solvent is generally present in an amount sufficient to dissolve/disperse the resin to the concentration desired for application. Typically the solvent is present in an amount of 20 to 99.9 wt%, preferably from 70 to 95 wt% based on the weight of resin and solvent.</p> |
