| 摘要 |
PURPOSE: A photosensitive composition is provided, which maintains high resolution stably by high sensitivity, particularly, membrane decreasing after developing treatment is little during formation of fine pattern of 0.2 micrometer or less and it gives the rectangle pattern stably. CONSTITUTION: A photosensitive composition comprises (i) polymer respectively soluble in water and insoluble in alkali, having repetition unit represented by formula 1, and 2, (ii) photo-acid generator, (iii) polymer characterized by being increased in solubility by acid reaction in alkali developing solution, having degradable groups by acid, and having repetition unit represented by formula 3, (iv) at least one compound having nitrogen, represented by formula 4 and/or aliphatic amine substituted by carboxyl group. |
